| 摘要 |
A polymer compound for photoresists contains alkali-soluble groups being protected by protecting groups capable of leaving with an acid, and is thereby insoluble or sparingly soluble in an alkaline developer, in which part or all of the protecting groups are multifunctional protecting groups each protecting two or more alkali-soluble groups. The alkali-soluble groups may be phenolic hydroxyl groups. The polymer compound may correspond to a polyol compound having an aliphatic group and an aromatic group bound to each other alternately, the aromatic group having an aromatic ring and two or more hydroxyl groups bound to the aromatic ring, except with phenolic hydroxyl groups of the polyol compound being protected by protecting groups capable of leaving with an acid. The polymer compound for photoresists can give a resist film with less line edge roughness (LER), while exhibiting excellent workability and resolution.
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