发明名称 |
IMPROVEMENT TO CYANIDE-FREE, ALKALINE COPPER STRIKE BATH, FOR ACHIEVING IMPROVED, SATISFACTORY ADHESION TO ZAMAK ALLOYS AND INCREASING BRIGHTNESS |
摘要 |
<p>The invention modifies commercial strike baths by adding a series of organic and inorganic compounds aimed at making the strike bath suitable for processes carried out in a rotary drum. The suitable ranges for the operational variables (temperature, stirring, pH and current density) and chemical composition (1-hydroxyethane, diphosphonic acid HEDP, Cu2 ion and additive concentration) are set in order to provide a strike bath having a satisfactory performance, thanks to the increase in HEDP concentration and pH, and to the admixture of potassium chloride. The deposits produced by adding salicyl sulphonic acid to the HEDP-based strike bath exhibit, besides a satisfactory adhesion, increased brightness in comparison with deposits produced from cyanide-containing baths without additives such as levelling and brightening agents.</p> |
申请公布号 |
WO2011011845(A1) |
申请公布日期 |
2011.02.03 |
申请号 |
WO2010BR00241 |
申请日期 |
2010.07.20 |
申请人 |
INSTITUTO PESQUISAS TECNOLOGICAS DO ESTADO DE SAOPAULO - IPT;VARGAS PECEQUILO, CRISTIANE;PANOSSIAN, ZEHBOUR |
发明人 |
VARGAS PECEQUILO, CRISTIANE;PANOSSIAN, ZEHBOUR |
分类号 |
C25D3/38;C25D5/34 |
主分类号 |
C25D3/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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