发明名称 IMPROVEMENT TO CYANIDE-FREE, ALKALINE COPPER STRIKE BATH, FOR ACHIEVING IMPROVED, SATISFACTORY ADHESION TO ZAMAK ALLOYS AND INCREASING BRIGHTNESS
摘要 <p>The invention modifies commercial strike baths by adding a series of organic and inorganic compounds aimed at making the strike bath suitable for processes carried out in a rotary drum. The suitable ranges for the operational variables (temperature, stirring, pH and current density) and chemical composition (1-hydroxyethane, diphosphonic acid HEDP, Cu2 ion and additive concentration) are set in order to provide a strike bath having a satisfactory performance, thanks to the increase in HEDP concentration and pH, and to the admixture of potassium chloride. The deposits produced by adding salicyl sulphonic acid to the HEDP-based strike bath exhibit, besides a satisfactory adhesion, increased brightness in comparison with deposits produced from cyanide-containing baths without additives such as levelling and brightening agents.</p>
申请公布号 WO2011011845(A1) 申请公布日期 2011.02.03
申请号 WO2010BR00241 申请日期 2010.07.20
申请人 INSTITUTO PESQUISAS TECNOLOGICAS DO ESTADO DE SAOPAULO - IPT;VARGAS PECEQUILO, CRISTIANE;PANOSSIAN, ZEHBOUR 发明人 VARGAS PECEQUILO, CRISTIANE;PANOSSIAN, ZEHBOUR
分类号 C25D3/38;C25D5/34 主分类号 C25D3/38
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