摘要 |
<P>PROBLEM TO BE SOLVED: To provide a tool for conditioning which is easy to control a process and capable of improving a tool service life. <P>SOLUTION: (1) A polishing tool includes a rigid substrate having a planar circular surface and a plurality of cutting edges 1 having a flat top face located within a constant level with respect to the circular surface fixedly disposed on the substrate. The top face 6 is surrounded by a plurality of linear ridges and is adjacent to a side face extending in a direction of a tool axis via the ridge, and at least the summit of the cutting edge is formed of sintered diamond. (2) A polishing method for removing a workpiece material using the polishing tool includes the steps of: pressing the cutting edge against the surface of the workpiece, thereby causing a deforming area displaced in the pressed direction on the surface of the workpiece; and removing the workpiece material at a border between the deforming area and a remaining area by further causing the linear ridge on the top of the cutting edge to relatively move from the deforming area. <P>COPYRIGHT: (C)2011,JPO&INPIT |