| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition that has high resolution performance and has a good balance between DOF (Depth Of Focus) and MEEF (Mask Error Enhancement Factor) in forming a fine pattern of 90 nm or less, and is suitably used also for a liquid immersion exposure process. <P>SOLUTION: The radiation-sensitive resin composition includes a polymer (A) and a solvent (B). The polymer includes a repeating unit (1) shown by general formula (1) as an essential component. Here, R<SP>1</SP>represents a hydrogen atom or the like, and Z represents a monovalent group that generates an acid upon exposure to radiation. <P>COPYRIGHT: (C)2011,JPO&INPIT |
