| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of aligning an electrode pattern in a selective emitter structure in order to solve a problem of alignment that may occur in forming an electrode pattern in a selective emitter structure by a conventional technique. <P>SOLUTION: The method includes steps of: providing a substrate; forming a barrier layer on the substrate, patterning the barrier layer, and thus exposing a portion of the substrate to form an electrode pattern region; changing the surface property of the substrate in the electrode pattern region to form a visible patterned mark; removing the barrier layer; and using the visible patterned mark as an alignment mark. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
