发明名称 COATING AND DEVELOPING SYSTEM, METHOD OF CONTROLLING COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM
摘要 A coating and developing system includes a cassette station, a processing station and an inspection station interposed between the cassette station and the processing station. Time for which a substrate is held uselessly in the inspection module is reduced. A substrate carrying means disposed in the inspection module places priority to transferring a substrate between the cassette station and the processing station, and transfers a substrate to an inspection module in a part of a cycle time in which a substrate carrying means disposed in the processing station carries out one carrying cycle. It is permitted to carry out a substrate from the inspection module in a skip carrying mode, in which a substrate specified by a larger ordinal numeral is carried ahead of a substrate specified by a smaller ordinal numeral. It is inhibited to carry a substrate to the inspection module in the skip carrying mode.
申请公布号 US2011029122(A1) 申请公布日期 2011.02.03
申请号 US20100902529 申请日期 2010.10.12
申请人 TOKYO ELECTRON LIMITED 发明人 KANEKO TOMOHIRO;MIYATA AKIRA
分类号 G06F19/00;H01L21/677 主分类号 G06F19/00
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