发明名称 BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD
摘要 A bipolar semiconductor device and method are provided. One embodiment provides a bipolar semiconductor device including a first semiconductor region of a first conductivity type having a first doping concentration, a second semiconductor region of a second conductivity type forming a pn-junction with the first semiconductor region, and a plurality of third semiconductor regions of the first conductivity type at least partially arranged in the first semiconductor region and having a doping concentration which is higher than the first doping concentration. Each of the third semiconductor regions is provided with at least one respective junction termination structure.
申请公布号 US2011024791(A1) 申请公布日期 2011.02.03
申请号 US20090512285 申请日期 2009.07.30
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 SCHULZE HANS-JOACHIM;PFIRSCH FRANK;NIEDEMOSTHEIDE FRANZ-JOSEF
分类号 H01L29/70;H01L21/8222;H01L29/861 主分类号 H01L29/70
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