| 摘要 |
<P>PROBLEM TO BE SOLVED: To solve the problem that a phenomenon of printing of a pattern, arranged outside an exposure region of a photo-reticle, on a wafer due to stray light occurs. <P>SOLUTION: A first masking blade for exposing only a desired pattern on a reticle by an exposure device is installed above a reticle stage, and a second masking blade is installed below the reticle stage to prevent light transmitted in a non-exposure region on the reticle from entering a projection lens owing to stray light. <P>COPYRIGHT: (C)2011,JPO&INPIT |
