| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system which securely checks the intrusion of a reaction gas into a rotary mechanism part, further swiftly heats and cools a wafer in a film deposition chamber, and further, exhaust a gas generated from a heater to the outside of the film deposition chamber. SOLUTION: The rotary barrel 104a comprises: a first rotary barrel 104a<SB>1</SB>; a second rotary barrel 104a<SB>2</SB>; and a third rotary barrel 104a<SB>3</SB>. The second rotary barrel 104a<SB>2</SB>is composed using a material having a thermal expansion coefficient lower than that of the material composing the first rotary barrel 104a<SB>1</SB>. The third rotary barrel 104a<SB>3</SB>is composed using a material having a thermal expansion coefficient higher than that of the second rotary barrel 104a<SB>2</SB>. In a state where the third rotary barrel 104a<SB>3</SB>elongates by heating with a heater 120, the height h<SB>3</SB>of the third rotary barrel 104a<SB>3</SB>and the height h<SB>2</SB>of the second rotary barrel 104a<SB>2</SB>are made the same. COPYRIGHT: (C)2011,JPO&INPIT |
