| 摘要 |
PROBLEM TO BE SOLVED: To provide a photocurable manicure composition having an excellent balance between adhesion, durability, and releasability while maintaining a predetermined cure rate, and a manicuring method using the same. SOLUTION: The photocurable manicure composition includes (A) 100 pts.wt. urethane acrylate oligomer having a weight average molecular weight of 500-8,000, (B) 10-60 pts.wt. methacrylate monomer, (C) 8-30 pts.wt. carboxylic acid modified polyester acrylate compound, (D) 3-15 pts.wt. polyol compound, and (E) 1-30 pts.wt. photopolymerization initiator, and the manicuring method uses this photocurable manicure composition. COPYRIGHT: (C)2011,JPO&INPIT
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