发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having transparency and showing proper resolution and proper adhesion to ground. <P>SOLUTION: The photosensitive resin composition includes a resin (A), a photopolymerization initiator (B), and a specific monomer (C), wherein the resin (A) is a resin obtained by: a compound (A1) having a tricyclodecane skeleton or a dicyclopentadiene skeleton and an unsaturated bond in a molecule; a compound (A2) having an epoxy group and an unsaturated bond within a molecule; a compound (A3) having an unsaturated bond other than the compounds (A1) and (A2) are copolymerized to obtain a copolymer (A6), with the obtained copolymer (A6) is reacted with a compound (A4) having an unsaturated monobasic acid to obtain a copolymer (A7); and the obtained copolymer (A7) is made to react with a polybasic acid anhydride (A5). <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011022376(A) 申请公布日期 2011.02.03
申请号 JP20090167592 申请日期 2009.07.16
申请人 TOYO INK MFG CO LTD 发明人 SASAKI HIROSHI;GOTO TAMAKI
分类号 G03F7/038;C08F2/50;C08F290/12;G02B5/20;G02F1/1335;G03F7/031 主分类号 G03F7/038
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