VACUUM VAPOR DEPOSITION APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a vacuum vapor deposition capable of correctly measuring the remaining amount of a vapor deposition material to be actually used for film deposition.

SOLUTION: In the vacuum vapor deposition apparatus, a crucible 3 being a container for vaporizing a vapor deposition material 2 is placed inside a vacuum chamber 1 and a film is formed on a substrate 4 by use of the vapor deposition material 2 vaporized in the crucible 3. The apparatus includes a measuring means for measuring a bulk of the vapor deposition material 2 in the crucible 3 from an outside of the vacuum chamber 1.

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