发明名称 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.
申请公布号 US2011025993(A1) 申请公布日期 2011.02.03
申请号 US20100901163 申请日期 2010.10.08
申请人 ASML NETHERLANDS B.V. 发明人 MULKENS JOHANNES CATHARINUS HUBERTUS
分类号 G03B27/52 主分类号 G03B27/52
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