发明名称 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION FOR ORGANIC INSULATING FILM, ORGANIC INSULATING FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition for an organic insulating film having a wide development margin and forming an interlayer insulating film excellent in transparency, solvent resistance, heat resistance, insulation stability and fitness for ITO, an organic insulating film using the same, and an organic EL display device and a liquid crystal display device including the organic insulating film. <P>SOLUTION: The positive photosensitive resin composition for an organic insulating film contains: (A) an alkali-soluble resin; (B) a 1,2-quinonediazide compound; and (C) a compound having two or more vinyl ether groups or vinyl thioether groups per molecule. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011022509(A) 申请公布日期 2011.02.03
申请号 JP20090169380 申请日期 2009.07.17
申请人 FUJIFILM CORP 发明人 KONDO SHUNICHI;ANDO TAKESHI;KAWABE YASUMASA
分类号 G03F7/023;C08F220/28;G03F7/004;H01L51/50 主分类号 G03F7/023
代理机构 代理人
主权项
地址