| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photovoltaic element that reduces a deterioration in characteristics due to an undesired reach of a layer and reduces an ineffective part. <P>SOLUTION: The method of manufacturing the photovoltaic element including an n-type semiconductor substrate, an amorphous or microcrystalline n-type semiconductor layer provided on the semiconductor substrate, and an amorphous or microcrystalline p-type semiconductor layer provided on the semiconductor substrate includes a process of forming the p-type semiconductor layer after a process of forming the n-type semiconductor layer. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
