发明名称 |
SiC AVALANCHE PHOTODIODE WITH IMPROVED EDGE TERMINATION |
摘要 |
An avalanche photodiode semiconductor device (20) for converting an impinging photon (22) includes a base n+ doped material layer (52) formed having a window section (72) for passing the photon (22). An n− doped material layer (30) is formed on the n+ doped material layer (52) having a portion of a lower surface (74) suitably exposed. An n+ doped material layer (32) is formed on the n− doped material (30). A p+ layer (24) formed on top of the n+ doped layer (32). At least one guard ring (26) is formed in the n− doped layer (30).
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申请公布号 |
US2011024768(A1) |
申请公布日期 |
2011.02.03 |
申请号 |
US20100906084 |
申请日期 |
2010.10.16 |
申请人 |
NORTHROP GRUMMAN SYSTEMS CORPORATION |
发明人 |
VELIADIS JOHN V. |
分类号 |
H01L31/0312;H01L31/102;H01L31/107 |
主分类号 |
H01L31/0312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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