| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To avoid a problem related to expansion and contraction of a template. <P>SOLUTION: The imprint lithography apparatus is arranged away from a substrate holder 58 and arranged between a structure 64 and the substrate holder 58 during the use of imprint template arrangements 50, 52. The structure 64 includes one or more arrays of lines or one or more encoders, and a substrate 56 or the substrate holder 58 and the imprint template have one or more encoders 68 that face the one or more arrays of lines or one or more arrays of lines that face the one or more encoders 68. The configuration determination arrangement is configured to determine a relative configuration between the substrate 56 or substrate holder 58 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the structure 64, and/or a relative configuration between the imprint template arrangements 50, 52 and the substrate 56 or substrate holder 58. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
