发明名称 |
TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY |
摘要 |
The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.
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申请公布号 |
US2011028299(A1) |
申请公布日期 |
2011.02.03 |
申请号 |
US20100904236 |
申请日期 |
2010.10.14 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
SAITOU KENTA;KOIKE AKIO;KAWATA MITSUHIRO |
分类号 |
C03C3/04;C03B20/00;C03C3/06;C03C3/076;G02B1/00;G03F1/22;G03F1/24;H01L21/027 |
主分类号 |
C03C3/04 |
代理机构 |
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主权项 |
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地址 |
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