发明名称 PLASMA STAMP AND METHOD FOR PLASMA TREATING A SURFACE
摘要 The invention relates to a plasma stamp having at least one cavity, at least one opening, before which a substrate to be treated can be arranged, a dielectrical floor arranged opposite the opening and a wall that is electrically conductive at least in regions arranged between the opening and the floor as a first electrode and having a second electrode which is arranged on a side of the floor averted from the cavity.
申请公布号 WO2011012255(A1) 申请公布日期 2011.02.03
申请号 WO2010EP04468 申请日期 2010.07.21
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.;THOMAS, MICHAEL;KLAGES, CLAUS-PETER;DOHSE, ANTJE 发明人 THOMAS, MICHAEL;KLAGES, CLAUS-PETER;DOHSE, ANTJE
分类号 H01J37/32;B05D7/24;B29C59/14;C23C14/04 主分类号 H01J37/32
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