发明名称 FOREIGN MATTER INFORMATION DETECTING METHOD, FOREIGN MATTER INFORMATION DETECTING DEVICE, OPTICAL SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and device detecting foreign matter information on foreign matters adhering to an optical member, and also to provide an optical system, an exposure device, and a device manufacturing method. <P>SOLUTION: A relay-use mirror 20 is equipped with: a plane of incidence 20a upon which exposure light EL is incident; and a reflection layer 27 emitting photoelectrons with incidence of the exposure light EL upon the plane of incidence 20a. The plane of incidence 20a of the relay-use mirror 20 is irradiated with a band-narrowed beam NL1 of a wavelength band narrower than that of the exposure light EL and the amount of photoelectrons emitted from the reflection layer 27 by irradiation of the band-narrowed beam NL1 with the relay-use mirror 20 is detected. Then, the foreign matter information on the foreign matters adhering to the relay-use mirror 20 is detected based on the detected amount of emitted photoelectrons. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011023467(A) 申请公布日期 2011.02.03
申请号 JP20090165755 申请日期 2009.07.14
申请人 NIKON CORP 发明人 SHIRAISHI MASAYUKI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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