发明名称 |
PATTERN FORMING APPARATUS AND METHOD, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To achieve exposure with high precision even on a contracted sheet material. <P>SOLUTION: A pattern forming method is provided, which includes: restraining at least two positions of an elongated sheet S in the longitudinal direction to apply a tension in the longitudinal direction to a prescribed area SA<SB>i</SB>in the longitudinal direction; adsorbing and restraining both sides of the sheet material by a holder SH<SB>2</SB>in the width direction intersecting the longitudinal direction of the sheet material to apply a tension in the width direction to the prescribed area SA<SB>i</SB>in the width direction; allowing a backside portion corresponding to the prescribed area of the sheet material S to change in accordance with a flat reference surface while the tensions in the longitudinal direction and in the width direction are applied to the prescribed area; and the prescribed area of the flattened sheet material is irradiated with an energy beam to form a pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011022585(A) |
申请公布日期 |
2011.02.03 |
申请号 |
JP20100161301 |
申请日期 |
2010.07.16 |
申请人 |
NIKON CORP |
发明人 |
KIUCHI TORU;MIZUTANI HIDEO |
分类号 |
G03F7/20;G02F1/13;H01L21/677;H01L21/68 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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