发明名称 |
Methods of Forming Strontium Titanate Films |
摘要 |
Embodiments of the current invention include methods of forming a strontium titanate (SrTiO3) film using atomic layer deposition (ALD). More particularly, the method includes forming a plurality of titanium oxide (TiO2) unit films using ALD and forming a plurality of strontium oxide (SrO) unit films using ALD. The combined thickness of the TiO2 and SrO unit films is less than approximately 5 angstroms. The TiO2 and SrO units films are then annealed to form a strontium titanate layer.
|
申请公布号 |
US2011027960(A1) |
申请公布日期 |
2011.02.03 |
申请号 |
US20100793611 |
申请日期 |
2010.06.03 |
申请人 |
MATZ LAURA M;RUI XIANGXIN;LEI XINJIAN;SHANKER SUNIL;KIM MOO-SUNG;FUCHIGAMI NOBI;BUCHANAN IAIN;DUONG ANH;MALHOTRA SANDRA;HASHIM IMRAN |
发明人 |
MATZ LAURA M.;RUI XIANGXIN;LEI XINJIAN;SHANKER SUNIL;KIM MOO-SUNG;FUCHIGAMI NOBI;BUCHANAN IAIN;DUONG ANH;MALHOTRA SANDRA;HASHIM IMRAN |
分类号 |
H01L21/285;H01L21/02 |
主分类号 |
H01L21/285 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|