发明名称 |
METHOD OF MANUFACTURING DEVICE, AND DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To prevent a functional film having a memory function etc., from deteriorating owing to water. SOLUTION: A method of manufacturing a device includes repeating, inside a deposition device: an insulating film-forming step of forming an insulating film on a substrate where the functional film is formed so as to cover the functional film; and a plasma-processing step of exposing a surface of the formed insulating film to plasma. COPYRIGHT: (C)2011,JPO&INPIT
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申请公布号 |
JP2011023390(A) |
申请公布日期 |
2011.02.03 |
申请号 |
JP20090164548 |
申请日期 |
2009.07.13 |
申请人 |
FUJITSU SEMICONDUCTOR LTD |
发明人 |
TSUCHIDE AKIRA |
分类号 |
H01L21/316;H01L21/768;H01L21/8246;H01L23/522;H01L27/105 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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