发明名称 METHOD OF MANUFACTURING DEVICE, AND DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent a functional film having a memory function etc., from deteriorating owing to water. SOLUTION: A method of manufacturing a device includes repeating, inside a deposition device: an insulating film-forming step of forming an insulating film on a substrate where the functional film is formed so as to cover the functional film; and a plasma-processing step of exposing a surface of the formed insulating film to plasma. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011023390(A) 申请公布日期 2011.02.03
申请号 JP20090164548 申请日期 2009.07.13
申请人 FUJITSU SEMICONDUCTOR LTD 发明人 TSUCHIDE AKIRA
分类号 H01L21/316;H01L21/768;H01L21/8246;H01L23/522;H01L27/105 主分类号 H01L21/316
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