发明名称 ATOMIC LAYER DEPOSITION POWDER COATING
摘要 A system and method are described for providing simultaneously conformal coating of a plurality of three dimensional objects using atomic layer deposition. The system comprises a dielectric tube adapted for maintaining the plurality of objects under vacuum and at least one inlet for providing a gaseous material in the dielectric tube. The dielectric tube used for comprising the objects is mounted rotatable so as to be able to rotate the plurality of objects under vacuum during atomic layer deposition of a coating on the plurality of objects.
申请公布号 WO2010046373(A3) 申请公布日期 2011.02.03
申请号 WO2009EP63758 申请日期 2009.10.20
申请人 UNIVERSITEIT GENT;DETAVERNIER, CHRISTOPHE;HAEMERS, JOHAN;DEDUYTSCHE, DAVY 发明人 DETAVERNIER, CHRISTOPHE;HAEMERS, JOHAN;DEDUYTSCHE, DAVY
分类号 C23C16/458;B01J3/03;B01J8/00;C23C16/44;C23C16/455 主分类号 C23C16/458
代理机构 代理人
主权项
地址