| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus in which a thin film, which does not possess film defects to be generated by sudden boiling or re-evaporation, can be deposited when a phosphor of a radiation image transformation panel is deposited by a vapor deposition method and to provide a method for depositing the phosphor of the radiation image transformation panel by using the vapor deposition apparatus. <P>SOLUTION: A crucible 2 of the vapor deposition apparatus 1 has a cover 3 which has a projecting part projecting into the internal space of the crucible 2, on the side wall face 8 of whose projecting part a boring 34 to be communicated with the inside of the crucible 2 is arranged and which can be removed from the crucible 2. The boring 34 is arranged in such a position that a raw material in the crucible 2 can not be viewed directly through the boring 34 from any place on a vapor deposition plane. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
