PHOTOVOLTAIC CELL WITH A SELECTIVE EMITTER AND METHOD FOR MAKING THE SAME.

摘要

Method of manufacturing a semiconductor device (1) including a substantially flat semiconductor substrate (2). The method comprises three steps. Step 1: applying a dopant source by selectively inkjetting a first pattern of a phosphoric acid or boric acid solution onto a main surface (2a) of said semiconductor substrate. Step 2: heating the substrate so as to diffuse phosphorus or boron atoms from said dopant source into said substrate, thereby forming first diffusion regions (4) immediately beneath the first pattern; and step 3: forming a metal contact pattern (10, 11, 12) substantially in alignment with said first diffusion regions. A photovoltaic cell manufactured through a method is also provided for.