发明名称
摘要 A low-pressure process apparatus for processing a substrate comprises a base, a stage, a housing and at least one first roller set. The stage is disposed on the base for supporting the substrate. The housing is detachably disposed on the base moving between a first position and a second position, wherein when the housing is in a first position, the housing and the base form a chamber to receive the stage. When the housing is detached, the first roller set contacts and supports the housing to facilitate movement thereof in a first horizontal direction.
申请公布号 JP4625799(B2) 申请公布日期 2011.02.02
申请号 JP20060354853 申请日期 2006.12.28
申请人 发明人
分类号 H01L21/027;F26B5/04 主分类号 H01L21/027
代理机构 代理人
主权项
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