发明名称 Method of producing positive resist composition, positive resist composition, and method of forming resist pattern
摘要 A method of forming a positive resist composition of the present invention includes a step (I) of passing a positive resist composition, which is obtained by dissolving a resin component (A) that displays increased alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), through a filter (f1) equipped with a nylon membrane, wherein the resin component (A) is a copolymer containing at least two structural units obtained by polymerizing at least one monomer in the presence of acid. According to the present invention, it is possible to provide a method of producing a positive resist composition, a positive resist composition, and a method of forming a resist pattern that are capable of forming a resist pattern with reduced levels of both bridge-type defects and reprecipitation-type defects.
申请公布号 US7879527(B2) 申请公布日期 2011.02.01
申请号 US20060996052 申请日期 2006.05.18
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 MUROI MASAAKI;ATSUCHI KOTA;NAKAMURA TAKAHIRO;YAMADA MASAKAZU;SAISYO KENSUKE
分类号 G03F7/004;G03F7/30 主分类号 G03F7/004
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