发明名称 |
Method of producing positive resist composition, positive resist composition, and method of forming resist pattern |
摘要 |
A method of forming a positive resist composition of the present invention includes a step (I) of passing a positive resist composition, which is obtained by dissolving a resin component (A) that displays increased alkali solubility under the action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), through a filter (f1) equipped with a nylon membrane, wherein the resin component (A) is a copolymer containing at least two structural units obtained by polymerizing at least one monomer in the presence of acid. According to the present invention, it is possible to provide a method of producing a positive resist composition, a positive resist composition, and a method of forming a resist pattern that are capable of forming a resist pattern with reduced levels of both bridge-type defects and reprecipitation-type defects.
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申请公布号 |
US7879527(B2) |
申请公布日期 |
2011.02.01 |
申请号 |
US20060996052 |
申请日期 |
2006.05.18 |
申请人 |
TOKYO OHKA KOGYO CO., LTD. |
发明人 |
MUROI MASAAKI;ATSUCHI KOTA;NAKAMURA TAKAHIRO;YAMADA MASAKAZU;SAISYO KENSUKE |
分类号 |
G03F7/004;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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