| 摘要 |
PURPOSE: A large plasmatron device is provided to rapidly process the surface of a large substrate by increasing the emission area of plasma. CONSTITUTION: An anode member(310) includes a first flow path into which plasma forming gas is injected. A nozzle connected to the first flow path is opened on one side of the anode member. A cathode member(320) is arranged on the first flow path of the anode member. A chamber member(330) is combined with the outside of the anode member. An outlet and an inlet connected to a second flow path are formed in the chamber member. The anode member, the cathode member, and the chamber member are formed in a longitudinal direction that is a vertical direction.
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