LARGE PLASMATRON SYSTEM AND SUBSTRATE PROCESSING METHOD USING THE SAME

摘要

PURPOSE: A large plasmatron system and a method for processing a substrate using the same are provided to improve work efficiency by a continuous line method. CONSTITUTION: A substrate supply unit(100) supplies a substrate(500). A conveyor transfers the substrate. A plasmatron device is arranged on the upper side of the conveyor and generates plasma. The plasmatron device simultaneously emits plasma to a plurality of substrates loaded in the width direction of the conveyor and textures or changes the surface of the substrate.