发明名称 Methods of enhancing performance of field-effect transistors and field-effect transistors made thereby
摘要 Methods of enhancing the performance of a field-effect transistor (FET) by providing a percolating network of metallic islands to the inversion layer of the FET so as to effectively reduce the channel length of the FET. The metal islands can be provided in a number of ways, including Volmer-Weber metallic film growth, breaking apart continuous metallic film, patterning metallic coating, dispersing metallic particles in a semiconducting material, applying a layer of composite particles having metallic cores and semiconducting shells and co-sputtering metallic and semiconducting materials, among others. FETs made using disclosed methods have a novel channel structures that include metallic islands spaced apart by semiconducting material.
申请公布号 US7879678(B2) 申请公布日期 2011.02.01
申请号 US20090393493 申请日期 2009.02.26
申请人 VERSATILIS LLC 发明人 JAIN AJAYKUMAR R.
分类号 H01L21/336;H01L29/76 主分类号 H01L21/336
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