发明名称 |
Substrate processing including a masking layer |
摘要 |
Methods for substrate processing are described. The methods include forming a material layer on a substrate. The methods include selecting constituents of a molecular masking layer (MML) to remove an effect of variations in the material layer as a result of substrate processing. The methods include normalizing the surface characteristics of the material layer by selectively depositing the MML on the material layer.
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申请公布号 |
US7879710(B2) |
申请公布日期 |
2011.02.01 |
申请号 |
US20060647882 |
申请日期 |
2006.12.29 |
申请人 |
INTERMOLECULAR, INC. |
发明人 |
FRESCO ZACHARY;LANG CHI-I;MALHOTRA SANDRA G.;CHIANG TONY P.;BOUSSIE THOMAS R.;KUMAR NITIN;TONG JINHONG;DUONG ANH |
分类号 |
H01L21/44 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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