发明名称 MEMORY SEMICONDUCTOR DEVICE AND METHODS OF FABRICATING AND OPERATING THE SAME
摘要 <p>PURPOSE: A memory semiconductor device, a manufacturing method thereof, and an operation method thereof are provided to improve the degree of integration by arranging word lines in a three dimension. CONSTITUTION: A ground selection structure and a string selection structure are separated from each other. A memory structure comprises sequentially laminated plurality of word lines. The memory structure is arranged between the ground and the string selection structure. A semiconductor pattern(65) covers the upper side and sidewall of the memory structure. The semiconductor pattern is connected to the ground and the string selection structure and crosses the word lines.</p>
申请公布号 KR20110010045(A) 申请公布日期 2011.01.31
申请号 KR20090121107 申请日期 2009.12.08
申请人 SAMSUNG ELECTRONICS CO., LTD.;THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 KIM, JI YOUNG;KANG L. WANG;PARK, YONG JIK;HAN JEONGHEE;AUGUSTIN JINWOO HONG
分类号 H01L29/786;H01L21/28 主分类号 H01L29/786
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