PHOTORESIST STRIPPER COMPOSITION

摘要

PURPOSE: A composition for removing aqueous photoresist is provided to effectively remove remaining photoresist without corrosion of a membrane. CONSTITUTION: A composition for removing aqueous photoresist contains: a compound selected from the group consisting of a compound of chemical formula 1 and quarternary ammonium hydroxides; a compound of chemical formula 2; a compound of chemical formula 3; one or more compounds selected from the group consisting of saccharides, sugar-aclohols, hydroxy cyalcoalkane compound of C3-10, aromatic hydroxy compound, acetylene alcohols, carboxylic acid compounds and anhydrides thereof; and deionized water.