LATERAL-FLOW DEPOSITION APPARATUS AND METHOD OF DEPOSITING FILM BY USING THE APPARATUS

摘要

PURPOSE: A horizontal flow deposition apparatus and a deposition method using the same are provided to deposit a film rapidly and simply by rotating a substrate while proceeding a depositing process. CONSTITUTION: A substrate support(101) supports a substrate(210). The substrate support moves up and down and rotates. A reactor cover(140) touches the substrate support. The reactor cover forms the reaction chamber.