ION IMPLANTATION DEVICE EQUIPPED WITH TWO OR MORE UNIFORMIZING LENSES, AND SELECTING METHOD OF TWO OR MORE UNIFORMIZING LENSES

摘要

PROBLEM TO BE SOLVED: To irradiate an ion beam having sufficiently uniform current density distribution against a semiconductor substrate even when energy reduction of the ion beam is advanced.SOLUTION: This ion injection device includes: an accelerating and decelerating device to accelerate or decelerate a ribbon-shaped ion beam in order to irradiate the ribbon-shaped ion beam having a desired energy onto the semiconductor substrate; a first uniformizing lens and a second uniformizing lens in order to uniformly control the electric current density distribution in the longitudinal direction of the ribbon-shaped ion beam; a treatment room in which the semiconductor substrate is arranged; and a beam current meter which is arranged in the treatment room and carries out measurement of the current density distribution in the longitudinal side direction of the ribbon-shaped ion beam. Then, when a route of the ribbon-shaped ion beam is seen from a treatment room side, the second uniformizing lens, the accelerating and decelerating device, and the first uniformizing lens are arranged in this order along the route of the ion beam.