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发明名称
FABRICATION OF FORCIBLY POLLUTED SAMPLE WAFER AND APPARATUS THEREFOR
摘要
申请公布号
JPH11204602(A)
申请公布日期
1999.07.30
申请号
JP19980004342
申请日期
1998.01.13
申请人
SONY CORP
发明人
KIYOTA HISAHARU
分类号
G01N1/00;G01N1/30;H01L21/02;H01L21/66;(IPC1-7):H01L21/66
主分类号
G01N1/00
代理机构
代理人
主权项
地址
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