发明名称 METHOD OF TREATING A GAS STREAM
摘要 A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.
申请公布号 US2011017140(A1) 申请公布日期 2011.01.27
申请号 US20100616195 申请日期 2010.02.11
申请人 发明人 BAILEY CHRISTOPHER MARK;GALTRY MICHAEL ANDREW;ENGERRAN DAVID;SEELEY ANDREW JAMES;YOUNG GEOFFREY;WILDERS MICHAEL ALAN ERIC;AITCHISON KENNETH ALLEN;HOGLE RICHARD A.
分类号 C23C16/00;B01D53/34 主分类号 C23C16/00
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