| 发明名称 |
METHOD FOR TREATING A SURFACE COATED WITH A FILM, AND DEVICE FOR TREATING A SURFACE COATED WITH A FILM |
| 摘要 |
<p>Disclosed is a method for treating a surface coated with a film, wherein a substrate (21) in which fine pores or grooves are formed on the surface on which a film is to be formed is employed, and a film (22) is formed over the whole surface of the substrate (21) including the inner wall surfaces and inner bottom surfaces of the pores or grooves; and the film (23) which is formed on the inner wall surfaces of the pores or grooves is planarized by plasma treatment of the surface of the film (22).</p> |
| 申请公布号 |
WO2011010653(A1) |
申请公布日期 |
2011.01.27 |
| 申请号 |
WO2010JP62217 |
申请日期 |
2010.07.21 |
| 申请人 |
ULVAC, INC.;KODAIRA SHUJI;YOSHIHAMA TOMOYUKI;KAMADA KOUKICHI;HORITA KAZUMASA;HAMAGUCHI JUNICHI;NAKANISHI SHIGEO;TOYODA SATORU |
发明人 |
KODAIRA SHUJI;YOSHIHAMA TOMOYUKI;KAMADA KOUKICHI;HORITA KAZUMASA;HAMAGUCHI JUNICHI;NAKANISHI SHIGEO;TOYODA SATORU |
| 分类号 |
H01L21/28;H01L21/285;H01L21/768 |
主分类号 |
H01L21/28 |
| 代理机构 |
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代理人 |
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| 主权项 |
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