GAS DISTRIBUTOR FOR SEMICONDUCTOR PROCESSING CHAMBER

摘要

PROBLEM TO BE SOLVED: To provide a processing chamber including a gas distributer for uniformly spraying processing gas in the chamber for a substrate having a large diameter.SOLUTION: This processing chamber (25) for processing a semiconductor substrate includes a support device for supporting a substrate (50). A gas distributor (90) for introducing processing gas into the chamber (25) includes a gas nozzle for injecting the processing gas at a predetermined inclined angle relative to a plane of the substrate (50) into the chamber (25). Optionally, a gas flow controller (100) controls and pulses the flow of the processing gas through one or more gas nozzles (140). An exhaust is used to exhaust the processing gas from the chamber (25).