发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
An immersion lithographic apparatus and method are disclosed in which measures are taken to account for dissolution of resist components, such as photo-acids or photo-acid generators, in immersion liquid. This may involve ensuring that each relevant part of the substrate is covered by liquid the same amount of time and/or by compensating for the differing amounts of time each relevant part of the substrate is covered by liquid by varying exposure intensity or duration based on the amount of time the substrate is covered by liquid.
|
申请公布号 |
US2011019168(A1) |
申请公布日期 |
2011.01.27 |
申请号 |
US20100881960 |
申请日期 |
2010.09.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
STREEFKERK BOB;MULKENS JOHANNES CATHARINUS HUBERTUS |
分类号 |
G03B27/52;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|