发明名称 APPARATUS FOR PROCESSING SUBSTRATES
摘要 PURPOSE: An apparatus for processing substrates is provided to increase the efficiency of a process at each chamber by making the laminated chamber module level. CONSTITUTION: A processing chamber(100) provides a space in which a process is operated. A lower chamber module(200) is located in lowest part of the processing chamber. A unit process performed in a lower chamber module. An upper chamber module(300) is laminated on the lower chamber module.
申请公布号 KR20110008877(A) 申请公布日期 2011.01.27
申请号 KR20090066421 申请日期 2009.07.21
申请人 SEMES CO., LTD. 发明人 ROH, JAE MIN;SEO, CHANG SIK;KOO, KYO WOOG
分类号 H01L21/687;H01L21/02 主分类号 H01L21/687
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