发明名称 METHOD FOR RELEASING A THIN SEMICONDUCTOR SUBSTRATE FROM A REUSABLE TEMPLATE
摘要 The present disclosure relates to methods and apparatuses for releasing a thin semiconductor substrate from a reusable template. The method involves forming a mechanically weak layer conformally on a semiconductor template. Then forming a thin semiconductor substrate conformally on the mechanically weak layer. The thin semiconductor substrate, the mechanically weak layer and the template forming a wafer. Then defining the border of the thin-film semiconductor substrate to be released by exposing the peripheral of the mechanically weak layer. Then releasing the thin-film semiconductor substrate by applying a controlled air flow parallel to said mechanically weak layer wherein the controlled air flow separates the thin semiconductor substrate and template according to lifting forces.
申请公布号 US2011021006(A1) 申请公布日期 2011.01.27
申请号 US20100826641 申请日期 2010.06.29
申请人 SOLEXEL, INC. 发明人 MOSLEHI MEHRDAD M.;WANG DAVID XUAN-QI;TOR SAM TONE;KRAMER KARL-JOSEF
分类号 H01L21/76;B25J15/06;H01L21/677 主分类号 H01L21/76
代理机构 代理人
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