| 摘要 |
PROBLEM TO BE SOLVED: To provide an evaluation pattern for evaluating the capabilities of an inspection device that detects an irregular pattern of an object having a periodic pattern, or the capabilities of detecting and analyzing the periodicity of the irregular pattern, and to provide a photomask having the evaluation pattern formed therein.SOLUTION: The evaluation pattern is a periodic pattern comprising two-dimensional unit patterns of a predetermined shape. The unit patterns in predetermined columns are shifted in size or/and position, and have the same amount of shift in size or/and position. Predetermined adjacent columns of the unit patterns shifted in size or/and position form one region. The regions including the unit patterns shifted in size or/and position are arranged in a periodic length, across a region having normal unit patterns. |
