发明名称 COATING-DEVELOPING APPARATUS
摘要 PURPOSE: A coating-developing apparatus is provided to increase the productivity of the device by allowing a substrate to be fed while other substrates are processed. CONSTITUTION: A carrier receives a plurality of substrates. A feeding unit(3c) supplies the substrates automatically. An interface block is allowed in between a process module and an exposure apparatus. The interface block includes a loading tool transferring the substrate.
申请公布号 KR20110009031(A) 申请公布日期 2011.01.27
申请号 KR20100069751 申请日期 2010.07.20
申请人 TOKYO ELECTRON LIMITED 发明人 MORIKAWA KATSUHIRO;NOBUKUNI CHIKARA;ENOKIDA SUGURU
分类号 H01L21/027 主分类号 H01L21/027
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