| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing pad capable of improving flatness of an object to be polished.SOLUTION: This polishing pad 20 has an urethane sheet 12 formed continuously by a wet film forming method and including cells 3 formed in its inside. The urethane sheet 12 brings a face on the opposite side to a face forming a film formation resin of a film forming basic material after wet film formation into pressure-contact with a pressure-contact roller and has buff treatment applied on a skin layer side. A skin layer is removed by the buff treatment and has a hole 5 on a polished face P. A sand paper to be used in the buff treatment has the flexible film basic material such as PET or the like, and abrasive grains are fixed on a surface of the film basic material by urethane resin to prevent the abrasive grains from dropping down due to the buff treatment. |
