SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus that prevents wafer transfer errors due to individual differences of boats.SOLUTION: In a CVD device using a first boat 21A and a second boat, a presence/absence detection unit 73 and an identification detection unit 74 of a boat detection device 72 of a boat identifying means are installed on an upper surface of a standby table 33 where a wafer is transferred to a boat by a wafer transfer device in a state wherein the boat is mounted; and elements 79 and 79 to be detected which correspond to the presence/absence detection unit 73 and identification detection unit 74 are protruded from the first boat 21A, and only the element 79 to be detected which corresponds to the presence/absence detection unit 73 is protruded from the second boat. When the boat detection device 72 detects both the elements 79 and 79 to be detected, the first board 21A is determined and when the boat detection device 72 detects only one element 79 to be detected, the second boat is determined. The wafer transfer device can be controlled under conditions corresponding to individual differences by identifying between the first boat 21A and the second boat, thereby preventing wafer transfer errors.