发明名称 |
APPARATUS AND METHOD FOR INSPECTING PATTERN DEFECT |
摘要 |
<p>Provided is a pattern defect inspecting apparatus wherein inspection performance is stabilized. The defect inspecting apparatus, which has a plurality of configuration units and inspects defects on the surface of a sample, is provided with a means for monitoring time-dependent changes and failures of some of or all of the configuration units, and a means for notifying the user of the results of the monitoring. Furthermore, a unit which can perform correction is provided with a correcting means, and also a means for replacing a failure component with a spare component which has been prepared in the device.</p> |
申请公布号 |
WO2011010425(A1) |
申请公布日期 |
2011.01.27 |
申请号 |
WO2010JP04106 |
申请日期 |
2010.06.21 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION;HATANO, HISASHI;YAMASHITA, HIROYUKI;NISHIYAMA, HIDETOSHI |
发明人 |
HATANO, HISASHI;YAMASHITA, HIROYUKI;NISHIYAMA, HIDETOSHI |
分类号 |
G01N21/956 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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