发明名称 Semiconductor device and method of manufacturing the same
摘要 A semiconductor device includes an antifuse element. The semiconductor device includes a first well of a first conductivity type disposed in a semiconductor substrate; a first insulating film on the first well; a first conductive film of the first conductivity type on the first insulating film; and an impurity-introduced region of the first conductivity type. The impurity-introduced region of the first conductivity type in the first well is higher in impurity concentration than the first well. The impurity-introduced region includes a first portion that faces toward the first conductive film through the first insulating film.
申请公布号 US2011018066(A1) 申请公布日期 2011.01.27
申请号 US20100805129 申请日期 2010.07.14
申请人 ELPIDA MEMORY, INC. 发明人 HORIBA SHINICHI;NAKAMURA NOBUYUKI;KITAMURA EIJI
分类号 H01L27/092;H01L23/525 主分类号 H01L27/092
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