发明名称 SEMICONDUCTOR WAFER SEPARATION MECHANISM
摘要 <p>Provided is a semiconductor wafer separation mechanism capable of separating semiconductor wafers one wafer at a time, with which it is possible to resolve the problem that manually separating semiconductor wafers causes the wafers to crack and/or break, reducing yield. The semiconductor wafer separation mechanism comprises: a wafer separation-facilitating tank for separating semiconductor wafers; a wafer mounting base comprising a plate provided with three separate stoppers for positioning a semiconductor wafer; a stopper to which the wafer mounting base is attached, said stopper being attached to a stopper height adjustment mechanism that adjusts the height of the stopper; a feed roller disposed above the stopper on the side of the wafer-supporting base; and an auxiliary roller disposed between the feed roller and the stopper.</p>
申请公布号 WO2011010749(A1) 申请公布日期 2011.01.27
申请号 WO2010JP62964 申请日期 2010.07.22
申请人 MAC INDUSTRIAL EQUIPMENT CORPORATION;KAWASAKI OSAMI;MIURA MAKOTO;HANDA MINORU 发明人 KAWASAKI OSAMI;MIURA MAKOTO;HANDA MINORU
分类号 H01L21/677 主分类号 H01L21/677
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